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Act (2020:543) Amending Act (1992:1685) on the Protection of Topographies for Semiconductor Products, Sweden

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Latest Version in WIPO Lex
Details Details Year of Version 2020 Dates Entry into force: September 1, 2020 Adopted: June 17, 2020 Type of Text Main IP Laws Subject Matter Layout Designs of Integrated Circuits Subject Matter (secondary) Enforcement of IP and Related Laws

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Main Text(s) Related Text(s)
Main text(s) Main text(s) Swedish Lag (2020:543) om ändring i lagen (1992:1685) om skydd för kretsmönster för halvledarprodukter         English Act (2020:543) Amending Act (1992:1685) on the Protection of Topographies for Semiconductor Products        

This is an unofficial translation of the law (2020:543) amending the Act (1992: 1685) on the Protection of Typographies for Semiconductor Products. Should there be any differences between this translation and the authentic Swedish text, the authentic Swedish text will prevail.

Law (2020:543) amending the Act (1992: 1685) on the Protection of Typographies for Semiconductor Products

Issued on the 17th of June 2020

Article 91 Anyone who intentionally or by gross negligence commits an act which infringes the right pursuant to Article 2, is punishable for topography violation with a fine or imprisonment for up to two years.

If the violation was committed intentionally and is considered serious, the person is punishable for serious topography violation with imprisonment for a minimum of six months up to a maximum of six years. When assessing whether the violation is serious, particular consideration has to be given to whether the act concerned

1. has been preceded by particular planning, 2. was part of criminal activities conducted in an organised form, 3. was conducted on a large scale, 4. was otherwise of a particularly dangerous nature. Anyone who has violated an injunction issued with a penalty of a fine

pursuant to Article 9 b, must not be held liable for infringements covered by the injunction.

Responsibility is assigned under Chapter 23 of the Criminal Code for attempting to commit or preparation of topography violation or serious topography violation.

The prosecutor may initiate a prosecution for violations only if the prosecution is motivated for being in the public interest. Act (2020:543).

This Act enters into force on the 1 September 2020.

1 Latest version 2005:304. 1

1

Svensk författningssamling

Lag om ändring i lagen (1992:1685) om skydd för kretsmönster för halvledarprodukter

Utfärdad den 17 juni 2020

Enligt riksdagens beslut1 föreskrivs att 9 § lagen (1992:1685) om skydd för

kretsmönster för halvledarprodukter ska ha följande lydelse.

9 §2 Den som uppsåtligen eller av grov oaktsamhet vidtar en åtgärd som

innebär intrång i rätten enligt 2 § döms för kretsmönsterbrott till böter eller

fängelse i högst två år.

Om brottet begåtts uppsåtligen och är att anse som grovt, döms för grovt

kretsmönsterbrott till fängelse i lägst sex månader och högst sex år. Vid

bedömningen av om brottet är grovt ska det särskilt beaktas om gärningen

1. har föregåtts av särskild planering,

2. har utgjort ett led i en brottslighet som utövats i organiserad form,

3. har varit av större omfattning, eller

4. annars har varit av särskilt farlig art.

Den som har överträtt ett vitesförbud enligt 9 b § får inte dömas till ansvar

för intrång som omfattas av förbudet.

För försök eller förberedelse till kretsmönsterbrott eller grovt kretsmönster-

brott döms det till ansvar enligt 23 kap. brottsbalken.

Åklagaren får väcka åtal för brott endast om åtal är motiverat från allmän

synpunkt.

Denna lag träder i kraft den 1 september 2020.

På regeringens vägnar

MORGAN JOHANSSON

Liv Bernitz

(Justitiedepartementet)

1 Prop. 2019/20:149, bet. 2019/20:NU18, rskr. 2019/20:312. 2 Senaste lydelse 2005:304.

SFS 2020:543 Publicerad

den 18 juni 2020

Additional Text(s) WTO Notifications Coversheet (3 text(s)) WTO Notifications Coversheet (3 text(s)) French Loi n° 2020:543 portant modification de la loi n°(1992:1685) sur la protection des topographies de produits semi-conducteurs Spanish Ley N° 2020:543 sobre modificaciones al Ley N° 1992:1685 de la Protección de las Topografías de Productos Semiconductores English Act (2020:543) Amending Act (1992:1685) on the Protection of Topographies for Semiconductor Products

This is an unofficial translation of the law (2020:543) amending the Act (1992: 1685) on the Protection of Typographies for Semiconductor Products. Should there be any differences between this translation and the authentic Swedish text, the authentic Swedish text will prevail.

Law (2020:543) amending the Act (1992: 1685) on the Protection of Typographies for Semiconductor Products

Issued on the 17th of June 2020

Article 91 Anyone who intentionally or by gross negligence commits an act which infringes the right pursuant to Article 2, is punishable for topography violation with a fine or imprisonment for up to two years.

If the violation was committed intentionally and is considered serious, the person is punishable for serious topography violation with imprisonment for a minimum of six months up to a maximum of six years. When assessing whether the violation is serious, particular consideration has to be given to whether the act concerned

1. has been preceded by particular planning, 2. was part of criminal activities conducted in an organised form, 3. was conducted on a large scale, 4. was otherwise of a particularly dangerous nature. Anyone who has violated an injunction issued with a penalty of a fine

pursuant to Article 9 b, must not be held liable for infringements covered by the injunction.

Responsibility is assigned under Chapter 23 of the Criminal Code for attempting to commit or preparation of topography violation or serious topography violation.

The prosecutor may initiate a prosecution for violations only if the prosecution is motivated for being in the public interest. Act (2020:543).

This Act enters into force on the 1 September 2020.

1 Latest version 2005:304. 1

1

Svensk författningssamling

Lag om ändring i lagen (1992:1685) om skydd för kretsmönster för halvledarprodukter

Utfärdad den 17 juni 2020

Enligt riksdagens beslut1 föreskrivs att 9 § lagen (1992:1685) om skydd för

kretsmönster för halvledarprodukter ska ha följande lydelse.

9 §2 Den som uppsåtligen eller av grov oaktsamhet vidtar en åtgärd som

innebär intrång i rätten enligt 2 § döms för kretsmönsterbrott till böter eller

fängelse i högst två år.

Om brottet begåtts uppsåtligen och är att anse som grovt, döms för grovt

kretsmönsterbrott till fängelse i lägst sex månader och högst sex år. Vid

bedömningen av om brottet är grovt ska det särskilt beaktas om gärningen

1. har föregåtts av särskild planering,

2. har utgjort ett led i en brottslighet som utövats i organiserad form,

3. har varit av större omfattning, eller

4. annars har varit av särskilt farlig art.

Den som har överträtt ett vitesförbud enligt 9 b § får inte dömas till ansvar

för intrång som omfattas av förbudet.

För försök eller förberedelse till kretsmönsterbrott eller grovt kretsmönster-

brott döms det till ansvar enligt 23 kap. brottsbalken.

Åklagaren får väcka åtal för brott endast om åtal är motiverat från allmän

synpunkt.

Denna lag träder i kraft den 1 september 2020.

På regeringens vägnar

MORGAN JOHANSSON

Liv Bernitz

(Justitiedepartementet)

1 Prop. 2019/20:149, bet. 2019/20:NU18, rskr. 2019/20:312. 2 Senaste lydelse 2005:304.

SFS 2020:543 Publicerad

den 18 juni 2020


Legislation Amends (1 text(s)) Amends (1 text(s)) WTO Document Reference
IP/N/1/SWE/4
IP/N/1/SWE/L/3
No data available.

WIPO Lex No. SE219